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Comparison ledger

Centura TPCC RTP XE+versus1512e

Applied Materials Centura TPCC RTP XE+, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Centura TPCC RTP XE+Applied Materials
1512eTegal
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials Centura TPCCTegal 1512e
Specifications
CH AXE+ Non-Toxic ATM[1]—
ConfigurationChemraz O-Ring[1]—
Edge RingS2[1]—
Bearing TypeStandard[1]—
CH BEmpty[1]—
CH CEmpty[1]—
CH DEmpty[1]—
CH ESingle Slot Fast Cooldown[1]—
CH FSingle Slot Fast Cooldown[1]—
Gas Line PurgeN2-10 SLM[1]—
Gas Line 102-10 SLM[1]—
Wafer Size8 inch[1]—
Chamber A ConfigurationXE+ Non-Toxic ATM - Chemraz O-Ring - RGA Port and Valve - MWBC - Edge Ring: S2 Bearing Type: Standard[1]—
Chamber E and F ConfigurationSingle Slot Fast Cooldown[1]—
RobotAsyst LPT2200 SMIF Robot[1]—
ControllerVita Computer Controller (Modular Controller)[1]—
Gas Delivery10 Ra Gas Panel, Top Feed Gas Line Input, Multiple Line Drop Gas Distribution, Gas Line Purge: N2-10 SLM, Gas Line 1: O2-10 SLM, Gas Line 2: N2-20 SLM, Gas Line 3: O2 1 SLM, STEC Z500 MFC Type First Manifold[1]—
Heat ExchangerSMC 40 GPM Stainless Steel Heat Exchanger[1]—
Gas Line 2N2-20 SLM[1]—
Gas Line 302 1SLM SLM[1]—
Gas Line 4None[1]—
Tool type—Industrial RIE plasma etcher system[2]
Stated configuration—With modules assembly for CI-4222[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com