Waferpedia

Comparison ledger

0020 18455 PartversusAlpha 303 i LPCVD

Applied Materials 0020 18455 Part, Tokyo Electron Alpha 303 i LPCVD, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
Alpha 303 i LPCVDTokyo Electron
OEMApplied MaterialsTokyo Electron
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartTokyo Electron Alpha 303 i LPCVD
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]—
Process Type—Low Pressure Chemical Vapor Deposition (LPCVD)[2]
Wafer Size—12 inch[2]
Vintage Year—2006[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing