Comparison ledger
Applied Materials 0010 47763, SPTS MACS ICP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | MACS ICPSPTS |
|---|---|---|
| OEM | Applied Materials | SPTS |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | SPTS MACS ICP |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 2nd Source New[2] | HR chamber[5] |
| Type | Monopolar Dual Heated[3] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[4] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Model | 0010-47763[2] | MACS ICP[5] |
| OEM | Applied Materials[2] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[3] | — |
| Quantity available (source) | 1[3] | — |
| Clamp type | — | standard WTC[5] |
| Coil RF power | — | Advanced Energy RFG3001, 3kw[5] |
| Platen RF power | — | ENI ACG-3B 13.56MHZ, 300w[5] |
| Load lock pump | — | Ebara AAL10[5] |
| Chamber pump | — | Ebara A30W[5] |
| Turbo pump | — | Leybold MAG2000CT[5] |
| Turbo Pump Controller | — | Leybold MAG Drive 2000[5] |
| Chiller | — | ATS/DEX-20ADI[5] |
| Manufacturer | — | SPTS / STS[5] |
| Category | — | Etch[6] |
| Wafer size | — | 8 inch[5] |
| Chamber | — | HR chamber[5] |
| Wafer capability | — | 6", 8" capable[5] |
| Wafer handling | — | MACS loader for cassette to cassette operation (2 load stations)[5] |
| Vacuum load lock | — | Carousel vacuum load lock[5] |
| Backside cooling | — | Helium backside cooling (HBC)[5] |
| Gases | — | C4F8 (200 sccm); SF6 (1000 sccm); O2 (200 sccm); Ar (50 sccm)[5] |
| Vintage | — | 2002[5] |
| Voltage | — | 208 Volts / 60 Hz, 40 Amps/phase[1] |
| Chamber quantity | — | 1 chamber[7] |
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