Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Lam Research SEZ 201, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | SEZ 201Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Lam Research SEZ 201 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | SEZ 201[5] |
| Description | HTESC PH 1 REV A[2] | Wafer Backside etcher with 2 x SMIF[5] |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Equipment type | — | Wafer backside etcher[3] |
| Manufacturer designation | — | Lam / SEZ[4] |
| Category | — | Etch[3] |
| Wafer size | — | 8 inch[3] |
| Version | — | 200mm[5] |
| Configuration & options | — | 2 SM[3] |
| Manufacturer | — | Lam Research[3] |
| Tool type | — | Backside etcher[3] |
| Configuration | — | 3 2 SM[3] |
| SMIF | — | 2 x SMIF[5] |