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Comparison ledger

0010-21246 Partversus9220

Applied Materials 0010-21246 Part, Hitachi 9220, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-21246 PartApplied Materials
9220Hitachi
OEMApplied MaterialsHitachi
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Hitachi 9220
Specifications
Length Measurement Reproducibility—± 1% or 3 nm (3σ) larger value[1]
Secondary Electron Image Resolution—3 nm at acceleration voltage 0.8 kV[1]
Acceleration Voltage—500 to 1600 V (variable in 10 V steps)[1]
Throughput (continuous measurement mode)—56 wafers / hr[1]
Measuring Range—0.1 μm to 2.0 μm[1]
Image Magnification (SEM)—1k to 300k times[1]
Stage Movement Range (X-axis)—0-200 mm[1]
Stage Movement Range (Y-axis)—0-200 mm[1]
Stage Drive Speed—Max. 100 mm / sec (each X-axis & Y-axis)[1]
Lens System—Electromagnetic Lens System, Booster Stock Lens[1]
Detection System—Scintillator / photomultiplier detector using EXB filter; 2 stage detection method for SE and BSE images[1]
Power Supply (208V variant)—208 V, 60 Hz, Single Phase[1]
Power Supply (100V variant)—100V, 60 Hz, Single Phase, 6kVA[1]
Power Supply (200V variant)—200V, 60 Hz, Single Phase[1]
Wafer Sizes Supported—2-inch, 8-inch, 12-inch[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com