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Comparison ledger

0010-16392 ESC Assemblyversus6500 HRe-

Applied Materials 0010-16392 ESC Assembly, Tegal 6500 HRe-, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyTegal 6500 HRe-
Cited variants—
Specifications
OEMApplied Materials[2]—
Model0010-16392[2]—
TypeESC Assembly[2]—
Wafer Size300 mm[3]—
Electrode ConfigurationDual[3]—
System type—Dual Frequency Etch System Series[1]
Tool architecture—Hosts a cluster of plasma etching tools[1]
Etch chamber configuration—One or two etching chambers[1]
Wafer processing modes—Serial or parallel wafer processing[1]
Loading ports—Single or dual loading ports[1]
Plasma generation—Dual frequencies for high-density, capacitively coupled plasma (CCP) generation[1]
Plasma confinement—Magnetic plasma confinement[1]
Etch precision—Down to the sub-micron level[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]plasmatherm.complasmatherm.com
  2. [2]Equipment inventory listing
  3. [3]spwindustrial.comspwindustrial.com