Waferpedia

Comparison ledger

0010-14300 Magnet AssyversusSOPHI 200 Ion

Applied Materials 0010-14300 Magnet Assy, Ulvac SOPHI 200 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-14300 Magnet AssyApplied Materials
OEMApplied MaterialsUlvac
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-14300 Magnet AssyUlvac SOPHI 200 Ion
Specifications
ConfigurationP4 Magnet Assy, IMP[1]—
Gearbox P/N0010-27417[1]—
Part Number0010-14300[1]—
DescriptionP4 Magnet Assy, IMP[1]—
Dose range (actual dose—1010~1014 ions/cm2)[2]
Beam current (~500μA) - Throughput—more than 100 pieces/h (6in)[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing