Comparison ledger
Applied Materials 0010-13622 RF Match for, Novellus 3290 STQ, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | 3290 STQNovellus |
|---|---|---|
| OEM | Applied Materials | Novellus |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Novellus 3290 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Recent model control system[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Phase | — | 3 Phase[2] |
| Frequency | — | 50 Hz[2] |
| DC Power Supply | — | 12 / 12 / 12 kW, 208 V[2] |
| Load Lock Pump | — | Varian V 70 Turbo Pump[2] |
| Wafer Size | — | 6 inch[3] |
| Power Supply Phase/Frequency | — | 3 Phase, 50 Hz[2] |
| Optional DC Power Supply | — | 6 / 6 / 12 kW, 208 V (option for 12 /12 / 12 kW AE Pinnacle at 400 V)[2] |
| Control System | — | Recent model control system with touch screen from both sides[2] |
| Temperature Controller | — | Latest version[2] |
| Cryo Pumps | — | CTI Cryo Pumps[2] |
| Water Pumps | — | Included[2] |
| Mass Flow Controllers | — | Upgrade to MFC vs. needle valve[2] |
| Pressure Controller | — | New[2] |
| Preheating | — | Installed Heater for Preheating (no RF Etch Position)[2] |
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