Comparison ledger
Applied Materials 0010-13622 RF Match for, Lam Research Gasonics Triple Speed NF, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Gasonics Triple Speed NFLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Lam Research Gasonics |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | 3 ch (HDP)[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Process type | — | Chemical Vapor Deposition (CVD)[2] |
| Number of chambers | — | 3 (HDP)[2] |
| Robot | — | Brooks robot[2] |
| SLM type | — | SLM type[2] |
| Ports | — | 3 port[2] |
| Loadlock helium reduction | — | loadlock helium reduction[2] |
| Vintage year | — | 2008[2] |
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