Comparison ledger
Applied Materials 0010-13622 RF Match for, Denton Vacuum Explorer 14, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Explorer 14Denton Vacuum |
|---|---|---|
| OEM | Applied Materials | Denton Vacuum |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Denton Vacuum Explorer 14 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | 2 RF Cathodes, RF Plasma Clean[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Chamber | — | 14"x 14"[2] |
| Voltage | — | 208 VAC[3] |
| Phase | — | 3 Phase[3] |
| Wafer Size | — | 4 inch[2] |
| Chamber Material | — | 304 stainless steel[4] |
| Chamber Dimensions | — | 30" (high) x 14" (wide) x 14" (deep)[4] |
| Deposition Techniques | — | Electron beam evaporation, thermal evaporation, sputtering[5] |
| Pumping System | — | CTI Cryogenics Cryo Torr 8 cryogenic pump; Varian DS 402 dual-stage rotary vane pump[4] |
| High Vacuum Valve | — | Electro-pneumatic gate valve[4] |
| Vacuum Gauges | — | Two Inficon BPG 400 combination Bayard-Alpert ionization gauge transmitters[4] |
| Electron Beam Source | — | Telemark TFI-241 (four pockets, 7 cm3/pocket) electron beam gun[4] |
| E-Gun Power Supply | — | Telemark TT-6 (6 kW) electron beam gun power supply with X/Y sweep memory[4] |
| Deposition Controller | — | Maxtek 260 quartz crystal deposition controller[4] |
| Substrate Fixture | — | Flat plate substrate holder for 4 inch wafers; configured for upward evaporation[4] |
| Substrate Heating | — | Backside heating element to reach 300°C maximum[4] |
| Ion Source | — | DVI CC-105 Broad Beam ion source[4] |
| Mass Flow Controllers | — | Two MKS 2179 mass flow controllers (0 – 100 SCCM)[4] |
| Control System | — | GE Fanuc PLC with color touch panel; GE Cimplicity software[4] |
| System Platform | — | DV-502A system platform[5] |
| Chamber Type | — | 12" x 12" Pyrex bell jar standard; others available[5] |
| Baseplate Diameter | — | 15 inches[5] |
| Diffusion Pump | — | 250 lps diffusion pump[5] |
| Mechanical Pump | — | 7 cfm, two-stage, direct-drive mechanical pump[5] |
| Evaporation Power Supply | — | 1 kva evaporation power supply switchable between two places on baseplate[5] |
| Electrical Requirements | — | 220V, 50/60 Hz, 20 amps[5] |
| Floor Space | — | 30" wide x 28" deep x 60" high[5] |
| Weight | — | 700 lbs[5] |
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