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0010-03485 Magnet AssyversusBTRC Humidity Temperature Benchtop

Applied Materials 0010-03485 Magnet Assy, Tenney BTRC Humidity Temperature Benchtop, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsTenney
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyTenney BTRC Humidity Temperature Benchtop
Specifications
ConfigurationWP AL 300mm PVD[1]With digital programmable controller[5]
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Temperature range—-68°C to +200°C[5]
Humidity range—20% to 95%[5]
Inside dimensions—20"L x 19"W x 22"H[5]
Voltage—240V, 1Ph, 60Hz, 23A[5]
Temperature range (alternative)—-70°C to +200°C[6]
Humidity range (alternative)—20% to 98% rh[6]
Inside dimensions (alternative)—20" L x 19.5" W x 22" H[6]
Cable port—2"[5]
Power—240V, 1Ph, 60Hz, 23A[5]
Controller—digital programmable controller[5]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing
  6. [6]inventory listing