Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Onto Innovation Nanospec 9200 Automated Film Analysis, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Nanospec 9200 Automated Film AnalysisOnto Innovation |
|---|---|---|
| OEM | Applied Materials | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Onto Innovation Nanospec 9200 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | The controller was refurbished / installed, however the H-axis does not move[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Throughput | — | over 200 wafers per hour[6] |
| Spectral Range | — | 400-800nm or 190-760nm[6] |
| Footprint | — | smallest on the market, less than half the fab space of comparable units[6] |
| SEMI Standard Compliance | — | E95-0200 (Human Interface Standard for Semiconductor Manufacturing Equipment)[6] |