Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusQMB 500

Applied Materials 0010-03485 Magnet Assy, Edwards QMB 500, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
QMB 500Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards QMB 500
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]QMB 500[6]
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]Compact mechanical booster with high pumping speeds[1]
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]Edwards[6]
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Equipment type—Pump[6]
Maximum continuous inlet pressure—20 mbar for QMB250F and QMB500F Mechanical Booster Pumps[1]
Cooling—Air-cooled for QMB500F; enclosed, water-cooled motor[1]
Inlet—ISO100[7]
Exhaust—ISO63[7]
Motor—3 phase, 208-230/460V, 50/60Hz[7]
Oil—hydrocarbon[7]
Weight—172 lbs[7]
Sources (8)Every fact above is drawn from these public sources
  1. [1]ajvs.comajvs.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]Equipment inventory listing
  7. [7]provac.comprovac.com
  8. [8]provac.comprovac.com