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Comparison ledger

0010-03485 Magnet AssyversusLP-8J

Applied Materials 0010-03485 Magnet Assy, Brooks LP-8J, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
LP-8JBrooks
OEMApplied MaterialsBrooks
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyBrooks LP-8J
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Series—LP Series[1]
Meter form—5S[1]
Depth—Low Profile 1.2" Depth[1]
Designed for—Communication cable routing, monitor equipment, and service provider access[1]
Can accommodate—RJ-11 telephone jack for direct access[1]
Construction—One-piece injection molded polycarbonate shell and clear polycarbonate dead-front safety shield[1]
Profile—Low Profile[1]
Application—Communication cable routing, monitor equipment, service provider access[1]
Sources (5)Every fact above is drawn from these public sources
  1. [1]brooksutility.combrooksutility.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com