Waferpedia

Comparison ledger

0010-03485 Magnet Assyversus0190-23942

Applied Materials 0010-03485 Magnet Assy, Applied Materials 0190-23942, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
0190-23942Applied Materials
OEMApplied MaterialsApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyApplied Materials 0190-23942
Specifications
ConfigurationWP AL 300mm PVD[1]1 CESC 5mm[6]
OEMApplied Materials[1]—
Model0010-03485[1]0190-23942[8]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]ESC OPUS 300mm[7]
ProcessPVD[3]—
Wafer size300mm[4]300 mm[7]
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]Applied Materials[8]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Part type—Electrostatic chuck (ESC) / Bipolar puck[5]
Configuration option—1 CESC 5mm[6]
Tool type—Bipolar Puck[5]
Configuration & options—1 CESC 5mm[6]
Status—In Production[6]
Type—Bipolar puck[5]
Sources (8)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]waferpedia.comwaferpedia.com
  6. [6]waferpedia.comwaferpedia.com
  7. [7]asseta.comasseta.com
  8. [8]Equipment inventory listing