Waferpedia

Comparison ledger

0010-03254 E ChuckversusE 2 M 2

Applied Materials 0010-03254 E Chuck, Edwards E 2 M 2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
E 2 M 2Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Edwards E 2 M 2
Specifications
Maximum displacement (50 Hz)—2.8 m³/h[1]
Maximum displacement (60 Hz)—3.4 m³/h[1]
Pneurop displacement (50 Hz)—2.4 m³/h[1]
Pneurop displacement (60 Hz)—2.9 m³/h[1]
Ultimate vacuum (partial pressure, no gas-ballast)—2.5×10⁻⁴ mbar[1]
Ultimate vacuum (total pressure, no gas-ballast)—1×10⁻³ mbar[1]
Ultimate vacuum (partial pressure, full gas-ballast)—3×10⁻² mbar[1]
Maximum water vapour inlet pressure—15 mbar[1]
Maximum water vapour pumping rate—0.03 kg/h[1]
Maximum permitted outlet pressure (at full pump throughput)—0.5 bar gauge[1]
Motor rotational speed (50 Hz)—1450 rpm[1]
Motor rotational speed (60 Hz)—1750 rpm[1]
Recommended oil—Ultragrade 19[1]
Maximum oil capacity—0.55 litre[1]
Dimensions (A x B, single-phase motor variant)—449 mm x 131 mm[1]
Ambient temperature range (operation)—12 to 40 °C[1]
Ambient temperature range (storage)—-30 to 70 °C[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]idealvac.comidealvac.com