Comparison ledger
Agilent 11980 A, Filmetrics F20, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11980 AAgilent | F20Filmetrics |
|---|---|---|
| OEM | Agilent | Filmetrics |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 11980 A | Filmetrics F20 |
| Cited variants | — | |
| Specifications | ||
| Wavelength Range | 1250-1600 nm[3] | — |
| Measurement technique | — | reflectance / optical reflectometry[2] |
| Primary measurement | — | film thickness[2] |
| Materials measured | — | dielectrics, semiconductors, and thin metals[2] |
| Spot size | — | large spot[2] |
| Optical model | — | multilayer optical models[2] |
| General use description | — | general purpose film-measurement instrument[1] |
| Wavelength range (F20-EXR variant mentioned in source) | — | 400-1700 nm[1] |
| Technique | — | Optical reflectometry (spectral reflectance)[4] |
| Measurement | — | Film thickness and refractive index (n & k)[2] |
| Beam size (ASU configuration) | — | Large spot[2] |
| Beam size (Utah configuration) | — | Small spot[5] |
| Analysis | — | Multilayer optical models[2] |
| Wavelength range (F20-EXR variant) | — | 400–1700 nm[1] |
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