Comparison ledger
Accretech , Tokyo Semitsu Kogaku (TSK) UF200, GCA 3696, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | , Tokyo Semitsu Kogaku (TSK) UF200Accretech | 3696GCA |
|---|---|---|
| OEM | Accretech | GCA |
| Category | — | — |
| Wafer size | Wafer Equipment | 150mm |
| Process node | — | legacy semiconductor lithography equipment |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | g-line |
| Family | Accretech , Tokyo Semitsu Kogaku (TSK) UF200 | GCA 3696 |
| Cited variants | — |
|
| Specifications | ||
| Wafer size | Wafer Equipment[2] | 3" up to 150mm; smaller pieces[1] |
| Date of Manufacture | 1998[2] | — |
| Currently Configured for | 200mm[2] | — |
| Current Equipment Status | Available[2] | — |
| Available date | Currently Available[2] | — |
| Equipment category | Production Wafer Prober[2] | — |
| Instrument type | — | Photorepeater system[1] |
| Conversion note | — | Can be easily converted to function as a GCA 3696 Photorepeater system[1] |
| Exposure target | — | Photoresist-coated glass plates[1] |
| Maximum plate size | — | Up to 7"[1] |
| Exposure wavelength | — | g-line (436nm)[1] |
| Numerical aperture | — | 0.30 N.A.[1] |
| Reduction | — | 5:1 reduction[1] |
| Field size | — | Variable field size up to 15mm square[1] |
| Minimum feature size | — | <0.9µm[1] |
| Registered alignment | — | Typically <0.25µm[1] |
| Mask size | — | 5" x 0.090"-thick masks[1] |
| Stage motion | — | Laser-controlled stage motion[1] |
| Type | — | Step-and-repeat camera (stepper)[3] |
| Lens | — | Zeiss lens with 0.30 numerical aperture[1] |
| Resolution | — | 0.9 µm[1] |
| Reduction ratio | — | 5:1[1] |
| Control computer | — | DEC PDP-11/04[3] |
| Interface chassis | — | 9280 Interface Chassis[3] |