Comparison ledger
ABM -407B-2-S-CE-S293 Robot, Zeiss Auriga 60, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Auriga 60Zeiss | |
|---|---|---|
| OEM | ABM | Zeiss |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-2-S-CE-S293 Robot | Zeiss Auriga 60 |
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[1] | — |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Electron Column | — | Zeiss Gemini Schottky field emission column[2] |
| Electron Beam Resolution at 15 kV | — | 1.0 nm[2] |
| Electron Beam Resolution at 1 kV | — | 1.9 nm[2] |
| Electron Beam Voltage Range | — | 0.1 kV to 30 kV[2] |
| Electron Beam Current Range | — | 4 pA to 100 nA[3] |
| Ion Column | — | Orsay Physics Cobra Ga+ liquid metal ion source[2] |
| Ion Beam Resolution at 30 kV | — | 2.5 nm[2] |
| Ion Beam Voltage Range | — | 0.2 kV to 30 kV[2] |
| Ion Beam Current Range | — | 1 pA to 50 nA[2] |
| Magnification | — | 12x to 1,000,000x[2] |
| Stage Capacity | — | Wafers up to 150 mm (6 inches) diameter[2] |
| Detectors | — | In-lens SE, SESI, EsB, 4QBSD, STEM detector[4] |
| EDX Detector | — | EDAX EDX detector[4] |
| EBSD Detector | — | EDAX EBSD detector[4] |
| Gas Injection System | — | C, Pt, Si, XeF2[4] |
| Manipulator | — | Omniprobe 400 with independent x,y,z motion and rotation[4] |
| Transfer System | — | High-vacuum transfer system compatible with glove box and UHV deposition[4] |
| Accessory Ports | — | 23 free accessory ports (standard Auriga has 15)[2] |
| Stage Travel | — | Motorized stage with 6 axes[2] |